Processing of Thulium Doped Structures
PROM Request Title:
Processing of Thulium Doped Structures
PROM Date:
05/27/2015
PROM Decision:
Request approved. VPD ICPMS results to be reviewed by the PROM Committee.
Link to PROM Request and supporting documentation:
Equipment List:
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
PROM Request Summary:
Request to use wafers with Thulium doping in litho, etch, and cleans. Contamination evaluation plan documented.