Published on Stanford Nanofabrication Facility (https://snfexfab.stanford.edu)

Home > Nafion dispersion D1021 in SNF

Nafion dispersion D1021 in SNF

PROM Request Title: 
Nafion dispersion D1021 in SNF
PROM Date: 
06/09/2015
PROM Decision: 
Request approved. Requestors will work with Usha to develop etch recipe.
Link to PROM Request and supporting documentation: 
Nafion dispersion D1021 in SNF [1]
Equipment List: 
SVG Resist Coat Track 1 (svgcoat)
Karl Suss MA-6 Contact Aligner 1 (karlsuss)
SVG Develop Track 1 (svgdev)
Drytek 100 Plasma Etcher (drytek2)
Intlvac Evaporation (Intlvac_evap)
PROM Request Summary: 
Request to bring Nafion D1021 into SNF to coat in Metallica and etch in Drytek2. Nafion to be dipsersed outside of SNF.

Source URL (modified on 23 May 2022 - 5:46 pm): https://snfexfab.stanford.edu/snf/prom-requests/nafion-dispersion-d1021-in-snf#comment-0

Links
[1] https://www.google.com/url?q=https%3A//docs.google.com/document/d/e/2PACX-1vRihuui6l1ZpZLVCPJUDwhvQTOKa0bXyhh7r1fmJTn9kbwshhuAjCJdQdxJLua1dYfxEs3jLv7qZ1Hh/pub&sa=D&source=editors&ust=1653356799166376&usg=AOvVaw3EK_O5KrcOFUHOG5WqpKWX