EE410 was a CMOS IC Fabrication lab course until winter 2015 quarter. For winter 2016, the class was changed from CMOS to Depletion mode NMOS fabrication. In winter 2017 quarter, the class was renumbered as EE312. Though not really a "baseline" process for the lab, the process/mask set routinely produces functional devices that researchers use as a starting point for their own devices. The Run Sheets and Final Reports are provided here for reference.