General New Normal Policies apply.
Lesker2 is a load locked single wafer metal sputter providing semi-clean processing options for semi-clean compatible materials. The eight gun magnetron Lesker is classified as semi-clean and provides non-directional thin film (< 1 um)
A shadowing session is recommended but not required. Only a training with tool owner is required. Training sessions are scheduled for 10:30am on the 1st Wednesday of the month. This training will qualify you for both Lesker sputtering systems. Review...
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter