Published on Stanford Nanofabrication Facility (https://snfexfab.stanford.edu)

Home > Samco PC300 Plasma Etch System (samco)

Cleanliness: 
Flexible
Lab Facility: 
SNF
Training Charges: 
0.50 hours
Primary Trainer: 
Lavendra Yadav Mandyam
Backup Trainer(s): 
Cliff Knollenberg
Primary Maintenance: 
Elmer Enriquez

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
    • Samco Operating Instructions
  2. Shadowing: **ALL SHADOWING MUST BE APPROVED BY SNF STAFF BEFORE SHADOWING SESSION AS PART OF NEW NORMAL POLICIES** Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form on clean room paper.
  3. Contact the primary trainer:
    Lavendra Yadav Mandyam
    .
Location: 
SNF Cleanroom Paul G Allen L107
Badger Area: 
SNF: Dry Etching
Badger ID: 
samco
Pieces
2 inch wafer
3 inch wafer
4 inch wafer
6 inch wafer
8 inch wafer
Other form factors
(O2)
(SF6)
(CF4)
Maximum Load: 
Four 4" wafers or two 6" wafers and one 8" wafer
Silicon
Silicon Germanium
Quartz
Sapphire
Glass
Germanium
Silicon Carbide
Gallium Nitride
III-V
Gallium Arsenide
Polymer
Carbon Polymer Based
Lithium Niobate
Other (ProMCom approval required)
Primary Materials Etched: 
()
Other Materials Etched: 
PDMS
Poly Si
Polyimide
Polymer
Si based materials
Silicon
Silicon Dioxide
Silicon Nitride
Silicon Oxynitride

Source URL (modified on 29 Sep 2021 - 5:28 pm): https://snfexfab.stanford.edu/guide/equipment/samco-pc300-plasma-etch-system-samco