Published on Stanford Nanofabrication Facility (https://snfexfab.stanford.edu)

Home > ALD Process for Top-Gating 2D Materials
Areas of Interest: 
2D Material integration, ALD, metal seed layers
Researchers and (Mentors): 
Akash Levy, Jung-Soo Kim, (Michelle Rincon), (J Provine), (Vijay Narasimhan)
Nano Nugget: 
SOP for Seeded ALD deposition on MoS2
SOP for Seeded ALD depositions on MOSCAPS and MIMS structures on Silicon
Lesker2 Sputter TiN Initial Development
Date: 
March 2020
Project Type: 
E241 [1]
Report: 
F19- ALD on MoS2 using Seed Layer Deposition & Characterization of Oxidized Seed Layer with ALD Aluminum Oxide Process Runsheet
Presentation: 
ALD Process for Top-Gating 2D Materials- Fall 2019 Final Presentation
Processing Technique (former Function and Method): 
Atomic Layer Deposition (ALD) [2]
Materials All: 
2D Materials [3]
Aluminum Oxide [4]
Titanium NItride [5]
Source URL (modified on 10 Aug 2023 - 11:24 am): https://snfexfab.stanford.edu/guide/projects/ald-process-for-top-gating-2d-materials

Links
[1] https://snfexfab.stanford.edu/snf/project-type/e241
[2] https://snfexfab.stanford.edu/guide/equipment/purpose/deposition/atomic-layer-deposition-ald
[3] https://snfexfab.stanford.edu/guide/materials/2d-materials
[4] https://snfexfab.stanford.edu/guide/materials/aluminum-oxide
[5] https://snfexfab.stanford.edu/guide/materials/titanium-nitride