Published on Stanford Nanofabrication Facility (https://snfexfab.stanford.edu)

Home > Electron beam lithography for ultra-low-loss photonic devices and systems
Areas of Interest: 
Electron Beam Lithography
Notes: 
PDF File: 
PDF icon snsf_final_report_20190115.pdf [1]
Researchers and (Mentors): 
Tim McKenna (Rich Tiberio)
Date: 
October 2019
Project Type: 
nano@stanford Fellowship [2]
Presentation: 
Overview of JEOL EBL for Curved Structures
Processing Technique (former Function and Method): 
Ebeam [3]
Runsheet: 
220 nm SOI photonics runsheet (2018-11-7)
Source URL (modified on 10 Aug 2023 - 11:24 am): https://snfexfab.stanford.edu/guide/projects/electron-beam-lithography-for-ultra-low-loss-photonic-devices-and-systems#comment-0

Links
[1] https://snfexfab.stanford.edu/sites/snfexfab/files/sections/diplayfiles/snsf_final_report_20190115.pdf
[2] https://snfexfab.stanford.edu/snf/project-type/nanostanford-fellowship
[3] https://snfexfab.stanford.edu/guide/equipment/processing-technique/photolithography/exposure/direct-write/ebeam