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Home > Characterizing ALD HfO2 roughness based on different deposition conditions
Date: 
September 2019
Project Type: 
Community Service [1]
Report: 
Project Proposal: Characterizing ALD HfO2 roughness based on different deposition conditions
Final Report: Characterizing ALD HfO2 roughness based on different deposition conditions
Function and Method: 
Thermal ALD [2]
Materials All: 
Hafnium Dioxide [3]
Source URL (modified on 8 Sep 2020 - 11:04 pm): https://snfexfab.stanford.edu/snf/projects/characterizing-ald-hfo2-roughness-based-on-different-deposition-conditions#comment-0

Links
[1] https://snfexfab.stanford.edu/snf/project-type/community-service
[2] https://snfexfab.stanford.edu/guide/equipment/purpose/deposition/atomic-layer-deposition-ald/thermal-ald
[3] https://snfexfab.stanford.edu/guide/materials/hafnium-dioxide