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Orthogonal lithography of organic thin films

PROM Request Title: 
Orthogonal lithography of organic thin films
PROM Date: 
03/28/2019
PROM Decision: 
No appropriate spin coater in SNF, user found capability at SNSF
Link to PROM Request and supporting documentation: 
Orthogonal lithography of organic thin films [1]
Equipment List: 
Headway Manual Resist Spinner (headway2)
Heidelberg MLA 150 (heidelberg)
Lithography Solvent Bench (lithosolv)
Drytek 100 Plasma Etcher (drytek2)
Wet Bench Flexible Solvents (wbflexsolv)
PROM Request Summary: 
Request to use Orthogonal photoresist in SNF
Source URL (modified on 23 May 2022 - 5:46 pm): https://snfexfab.stanford.edu/snf/prom-requests/orthogonal-lithography-of-organic-thin-films

Links
[1] https://www.google.com/url?q=https%3A//drive.google.com/a/stanford.edu/file/d/1JwFHJHWh87i5hmx80gM6jhylUo7kP4pX/view%3Fusp%3Dsharing&sa=D&source=editors&ust=1653356799077126&usg=AOvVaw2cPz3vspMytD4b_GbmexxX