Orthogonal lithography of organic thin films
PROM Request Title:
Orthogonal lithography of organic thin films
PROM Date:
03/28/2019
PROM Decision:
No appropriate spin coater in SNF, user found capability at SNSF
Link to PROM Request and supporting documentation:
Equipment List:
Headway Manual Resist Spinner (headway2)
Heidelberg MLA 150 (heidelberg)
Wet Bench Solvent Lithography (lithosolv)
Wet Bench Flexible Solvents (wbflexsolv)
PROM Request Summary:
Request to use Orthogonal photoresist in SNF