Skip to content Skip to navigation

Titanium

Chemical Formula:

Ti

Equipment Tabs

Annealing & Oxidation Equipment

No equipment matches all of the filter criteria you have set above.

Deposition Equipment

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Lesker2 Sputter lesker2-sputter	Semiclean	SNF Cleanroom Paul G Allen L107	1 μm	Ag Al Al₂O₃ AlSi Cr Ge In_xSn_yO_z Mo Pd Ru Sc Si SiO₂ Sn Ta Ti TiN W
Lesker Sputter lesker-sputter	Flexible	SNF Exfab Paul G Allen 155A Venice		Ag Al Al₂O₃ AlSi Au Co Cr Cu Fe In_xSn_yO_z Nb Ni Pd Si SiO₂ Ta Ti TiN W
Intlvac Evaporation Intlvac_evap	Clean Semiclean	SNF Cleanroom Paul G Allen L107	0 - 1 μm	Al Co Cr Ge Hf Mo Nb Ni Pd Si Ta Ti V W Zr
Innotec Evaporator Innotec	Flexible	SNF Cleanroom Paul G Allen L107		Ag Al Au Co Cr Cu Fe Ge In Mo Ni Pd Si Ta Ti W
AJA2 Evaporator aja2-evap	Semiclean	SNF Cleanroom Paul G Allen L107	0 - 300 nm	Ag Al Co Cr Ge Hf Mo Nb Pd Pt Si Ta Ti V W Zr
AJA Evaporator aja-evap	Flexible	SNF Exfab Paul G Allen 155A Venice	0 - 300 nm	Ag Al Au Co Cr Cu Fe Ge Hf Ni Ni_xO_y Pd Pt SiO₂ Ti TiO₂

Etching Equipment

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched
Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107	Metals Al Au Cr Si SiO₂ Resist	GaAs SiN Ti W
Wet Bench CMOS Metal (wbclean3) wbclean3	Semiclean	SNF Cleanroom Paul G Allen L107	Al Ti W
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten