Equipment name & NEMO ID | Technique | Cleanliness | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Resist | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Heidelberg MLA 150 heidelberg |
All |
|
405 nm |
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1 | ||||||||||
Headway Manual Resist Spinner headway2 |
All |
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one piece or wafer | ||||||||||||
Flexus 2320 Stress Tester stresstest |
All |
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1 | ||||||||||||
Finetech Lambda flipchipbonder |
Flexible |
°C - 400 °C
|
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1 | |||||||||||
Fiji 3 ALD fiji3 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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Fiji 2 ALD fiji2 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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|||||||||||
Fiji 1 ALD fiji1 |
Semiclean |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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EVG Contact Aligner evalign |
All |
|
350 - 450 nm | 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch |
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one piece or wafer | ||||||||
EVG 101 Spray Coater evgspraycoat |
All |
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1 | ||||||||||||
Critical Point Dryer Tousimis Automegasamdri-915B cpd |
Flexible |
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ASML PAS 5500/60 i-line Stepper asml |
All |
|
365 nm | 5 inch |
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AJA2 Evaporator aja2-evap |
Semiclean |
0.00 -
300.00 nm
|
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4"x3 or 6"x1 wafers or pieces | |||||||||||
AJA Evaporator aja-evap |
Flexible |
0.00 -
300.00 nm
|
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4"x3 or 6"x1 wafers or pieces |