H2 Anneal in CVD Nano Tube Tool of Silicon for Smoothing Sidewall Scallops Formed During Bosch Process Deep Silicon Etch
PROM Request Title:
H2 Anneal in CVD Nano Tube Tool of Silicon for Smoothing Sidewall Scallops Formed During Bosch Process Deep Silicon Etch
PROM Request Summary:
Request to create Si smoothing process in CNT furnace (similar to Epi process but in contamintated category furnace).
PROM Date:
03/14/2016
PROM Decision:
Approved.
Link to PROM Request and supporting documentation:
Equipment List:
