Deposit LPCVD nitride on 10 nm ALD Al2O3
PROM Request Title:
Deposit LPCVD nitride on 10 nm ALD Al2O3
PROM Request Summary:
Procedure to go from Fiji1 (semiclean) to LPCVD furnace (clean).
PROM Date:
03/21/2017
PROM Decision:
Request approved.
Link to PROM Request and supporting documentation:
Equipment List:
