Deposited Silicon Nitride (commonally called "nitride') is used as an isulator in traditional semiconductors, a masking layer or a stuctural layer in some mechanical applications.
LPCVD: Thermco Nitride Deposition Furnace
Low stress Silicon nitride is deposited in the PlasmaTherm Shuttlelock PECVD System (ccp-dep) by the reaction between silane (5% Silane in He) and nitrogen.
In the HDPCVD system, 100% silane and N2 are the reactants to produce silicon nitride film.
ALD: atomic layer deposition