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Process or Materials Review Requests (PROM) Archive

The PROM (PROcess and Materials) Committee is the forum which we use to evaluate new materials and proposed processes for use in the SNF and ExFab labs. The committee will provide input regarding the safety and compatibility of the proposal, ideally within one week.

If there is an archived request that states "Please contact staff for details", it is because the requestor has asked to keep some information confidential. Please contact the process staff to discuss your questions and they can help!

Please fill this out and submit to snf-promcommittee at lists dot stanford dot edu for review.

PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
Use of Lift Off Resist PMGI SF9 12/15/2021 Request for personal LOR in SNF. Request approved. Please see process staff for details.
Perminex 1000 Series 12/14/2021 Use of SU-8 like personal chemical in SNF. Request approved. Please see process staff for details.
Etching of BTO and STO in MRC etcher 12/14/2021 Etch of BTO and STO in MRC. Request approved. Please see process staff for details.
Diazonium use in Mavericks 12/14/2021 Chemical process to be performed in Mavericks. Request approved. Please see process staff for details.
Perovskite etching of BTO, STO, and KTO 12/14/2021 Etch of BTO, STO, and KTO perovskites in MRC. Request approved for MRC only.
Nitric Acid Wet Etching for Selective Removal of Ag from Ag-Au alloys 12/14/2021 Request for new process. Request approved.
BCB use for wafer bonding and subsequent polishing 12/13/2021 Use of new bonding chemical in SNF. Request approved. Etch restricted to Ox-RIE.
Grinding, polishing, annealing, wet chemistry clean of Strontium Titanate Crystals 12/02/2021 Use of non-standard materials on CMP gold contaminated equipment. Request approved.
Grinding, polishing, annealing, wet chemistry clean of Barium Titanate Crystals 12/02/2021 Use of non-standard materials on CMP gold contaminated equipment. Request approved.
Grinding, polishing, annealing, wet chemistry clean of Potassium Tantalate Crystals 12/02/2021 Use of non-standard materials on CMP gold contaminated equipment. Request approved.

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