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Stanford Nanofabrication Facility
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. ANY shadowing must be coordinated with SNF staff first.
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Indium Gallium Aluminum Nitride
Chemical Formula:
InGaAlN
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Deposition Equipment
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SNF MOCVD Paul G Allen 213XA
0
-
5 μm
AlGaN
AlN
GaN
InAlN
InGaAlN
InGaN
InN
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