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Chlorine

Chemical Formula:

Cl₂

Gases Equipment Tabs

Etch Equipment Table

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched	Gases
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL	Flexible	SNF Cleanroom Paul G Allen L107	Al Various	GaN	Ar BCl₃ CF₄ CH₄ Cl₂ N₂ O₂ SF₆
Oxford III-V etcher Ox-35	Flexible	SNF Cleanroom Paul G Allen L107	GaAs	AlGaN AlInP GaN InGaP InSb	Ar BCl₃ CH₄ Cl₂ H₂ HBr N₂ O₂ SF₆
Lam Research TCP 9400 Poly Etcher lampoly	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Si Poly Silicon	Ge SiGe	80% He/ 20%O₂ C₂F₆ CF₄ Cl₂ HBr He N₂ O₂
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten	80% He/ 20%O₂ Ar CF₄ CHF₃ Cl₂ HBr He N₂ NF₃ O₂ SF₆

Anneal/Oxidation Equipment Table

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