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Wet Bench Germanium (wbgen2)

Overview

The Wet Bench Germanium is for acid or base processing of Clean Germanium wafers only  
Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Process Temperature Range: 
Maximum Load: 
25
Notes: 

Clean Germanium wafers only: Pre-Diffusion Clean

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
  2. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form on clean room paper.
  3. Contact the primary trainer: .
Notes: 

wbclean-1 and -2 required

Operating Instructions