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Teos2 (teos2)

Overview

Teos2 is the third furnace from the top of the Tylan2 bank.

SNF staff

Teos2 furnace allows LPCVD deposition of silicon dioxide, using tetraethyl orthosilicate (TEOS) which can provide a more conformal coating at lower temperature than tylanbpsg films. This is a six inch tube.

Cleanliness: 
Clean

Processing Technique(s)

Capabilities and Specifications

Cleaning Required: 
Pre-Diffusion Clean
Material Thickness Range: 50.0 Å - 5.0 μm
Process Temperature Range: 
450 °C - 680 °C
Maximum Load: 
45
Notes: 

Very conformal.

Lab Facility, Location, and Badger Information

Lab Organization: 
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location: 
SNF Cleanroom Paul G Allen L107
Badger Area: 
SNF: Chemical Vapor Deposition
Badger ID: 
teos2

Training and Maintenance

Lab Facility: 
SNF Cleanroom
Training Charges: 
3.00 hours
Primary Trainer: 
Maurice Stevens
Primary Maintenance: 
Saeed Nejad

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
  2. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form on clean room paper.
  3. Contact the primary trainer:
    .

Operating Instructions

Teos2