Lift-off is a method of patterning a target material (typical a metal) using a sacrificial layer (typically photoresist) to define the pattern. First, the sacrificial layer is applied and patterned optically; then the target material is deposited on top. The final step is to dissolve the resist, lifting away any metal that was on top of it and leaving the rest of the patterned metal on the substrate.
UCSB has an excellent liftoff tutorial here.
|Equipment name & Badger ID||Location||Image||Overview||Link to Training|
Ex Fab Solvent Wet Bench
|SNF Exfab Paul G Allen 104 Stinson||
Exfab solvent wet bench (wbexfab_solv, wbexfab_plug - badger names) is for wet chemical processing with solvents of standard and non-standard materials (flexible) like glass and standard/non-standard metals for pieces and...Read more
Wet Bench Flexible Solvents
|SNF Cleanroom Paul G Allen L107||
The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects such as equipment parts. The bench is equipped with...Read more
|Wet Bench Flexible Solvents 1 and 2 Training|