Skip to content Skip to navigation

Metal Lift-off

Lift-off is a method of patterning a target material (typical a metal) using a sacrificial layer (typically photoresist) to define the pattern. First, the sacrificial layer is applied and patterned optically; then the target material is deposited on top. The final step is to dissolve the resist, lifting away any metal that was on top of it and leaving the rest of the patterned metal on the substrate.

UCSB has an excellent liftoff tutorial here.

Subscribe to
Equipment name & Badger ID Location Image Overview Link to Training
Ex Fab Solvent Wet Bench
SNF Exfab Paul G Allen 104 Stinson

Exfab solvent wet bench (wbexfab_solv, wbexfab_plug - badger names) is for wet chemical processing with solvents of standard and non-standard materials (flexible) like glass and standard/non-standard metals for pieces and...Read more

WbExfab_Solv Training
Wet Bench Flexible Solvents
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects such as equipment parts. The bench is equipped with...Read more

Wet Bench Flexible Solvents 1 and 2 Training


  • More About Liftoff

    Lift-off procedures have been a tool researchers have been using for decades to transfer patterns when etching them just wouldn't do. In fact, the whole technique of lift-off was created...


  • Image of the Tale of Two Cities 5.9 micron by 5.9 micron

    Tiny Tale Gets Grand

    Professor Richard Feynman issued a challenge to the world in 1960 to miniaturize the text on a page of a book to such an extent that it could be readable by an electron microscope. Twenty-six years later, Tom Newman, Stanford Graduate Student of Professor Fabian Pease finally claimed the $1,000 prize!