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Optical Photolithography

Photolithography is the process used to transfer patterns of geometric shapes to a flat substrate. The substrates are first coated with a material called resist, then light (called optical photolithography) is used to catalyze reactions in the resist to create the shape of the pattern. The resist is then developed to separate the un-reacted and reacted portions, leaving a pattern on the substrate. The patterned resist can be used to pattern your material of choice with additional processes like etching or liftoff. 

The SNF has various types of equipment that use light to create patterns in the resist. There are other methods which use electron beams (called e-beam lithography) instead and those processes can be done in the SNSF. 

The subcategories list the equipment that perform the different steps of the lithography process.

  • ​Exposure lists the tools that will use light to create a reaction in the resist. Different tools use different light wavelengths and have different resolution capabilities.
  • Mask cleaning (Manual) is the equipment used to clean masks for use in exposure equipment which requires a physical mask.
  • Resist bake lists the equipment that heats the resist after it is applied.
  • Resist coat lists the equipment that is used to put resist on a sample.
  • Resist develop lists the equipment that uses solvents to separate the non-reacted and reacted resist after exposure.
  • Wafer preparation before resist lists the equipment that is used to treat your sample surface before the resist coat to help ensure adhesion and uniform coating.

 

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Equipment name & Badger ID Location Image Overview Link to Training
SVG Resist Coat Track 1
svgcoat
SNF Cleanroom Paul G Allen L107

The SVG (Silicon Valley Group) coater is an automated track system for dispensing photoresist on 4" silicon, glass, or quartz wafers. The system includes two stations: a prime oven which...Read more

SVG Resist Coat Tracks 1 and 2 Training
SVG Resist Coat Track 2
svgcoat2
SNF Cleanroom Paul G Allen L107
SVGcoat2 back track

The SVG (Silicon Valley Group) coater is an automated track system for dispensing photoresist on 4" silicon, glass, or quartz wafers. The system includes two stations: a prime oven which...Read more

SVG Resist Coat Tracks 1 and 2 Training
Ultraviolet Photoresist Cure
uvcure
SNF Cleanroom Paul G Allen L107

primary wavelength: 254 nmRead more

Ultraviolet Photoresist Cure Training
Wet Bench Miscellaneous
wbmiscres
SNF Cleanroom Paul G Allen L107

The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a...Read more

Wet Bench Miscellaneous Photoresist Training
White Oven
white-oven
SNF Cleanroom Paul G Allen L107

For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C. This oven is programmable.Read more

White Oven Training

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