Resist Develop (manual)
| Equipment name & Badger ID | Location | Image | Overview | Link to Training |
|---|---|---|---|---|
|
Wet Bench Miscellaneous wbmiscres |
SNF Cleanroom Paul G Allen L107 |
 |
The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a...Read more |
Wet Bench Miscellaneous Photoresist Training |
