Resist Develop (manual)
| Equipment name & Badger ID | Location | Image | Overview | Link to Training |
|---|---|---|---|---|
|
Ebeam Process Wet Bench wbebres |
SNF Cleanroom Paul G Allen L107 | Ebeam Process Wet Bench Training | ||
|
Wet Bench Miscellaneous wbmiscres |
SNF Cleanroom Paul G Allen L107 |
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The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a...Read more |
Wet Bench Miscellaneous Photoresist Training |
