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Resist Develop (manual)

Equipment name & Badger ID Location Image Overview Link to Training
Ebeam Process Wet Bench
wbebres
SNF Cleanroom Paul G Allen L107 Ebeam Process Wet Bench Training
Wet Bench Miscellaneous
wbmiscres
SNF Cleanroom Paul G Allen L107

The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a...Read more

Wet Bench Miscellaneous Photoresist Training