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Resist Develop

Equipment name & Badger ID Location Image Overview Link to Training
Ebeam Process Wet Bench
wbebres
SNF Cleanroom Paul G Allen L107 Ebeam Process Wet Bench Training
Ex Fab Develop Wet Bench
wbexfab_dev
SNF Exfab Paul G Allen 104 Stinson

The wbexfab_dev wet bench is primarily used for developing of photoresist. No solvents may be used here. Please use solvent wet bench for SU8 development. The bench is equipped with...Read more

WbExfab_Dev Training
SVG Develop Track 1
svgdev
SNF Cleanroom Paul G Allen L107
SVGdev1 back track

The SVG (Silicon Valley Group) developer is an automated system with two independent tracks (svgdev and svgdev2) for developing and post-baking exposed photoresist-coated 4" wafers. Each track system includes two...Read more

SVG Resist Develop tracks 1 and 2 Training
SVG Develop Track 2
svgdev2
SNF Cleanroom Paul G Allen L107
SVGdev2 front track

The SVG (Silicon Valley Group) developer is an automated system with two independent tracks (svgdev and svgdev2) for developing and post-baking exposed photoresist-coated 4" wafers. Each track system includes two...Read more

SVG Resist Develop tracks 1 and 2 Training
Wet Bench Miscellaneous
wbmiscres
SNF Cleanroom Paul G Allen L107

The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a...Read more

Wet Bench Miscellaneous Photoresist Training

Documentation