SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Resist Develop
| Equipment name & Badger ID | Location | Image | Overview | Link to Training |
|---|---|---|---|---|
|
Ebeam Process Wet Bench wbebres |
SNF Cleanroom Paul G Allen L107 | Ebeam Process Wet Bench Training | ||
|
Ex Fab Develop Wet Bench wbexfab_dev |
SNF Exfab Paul G Allen 104 Stinson |
The wbexfab_dev wet bench is primarily used for developing of photoresist. No solvents may be used here. Please use solvent wet bench for SU8 development. The bench is equipped with...Read more |
WbExfab_Dev Training | |
|
SVG Develop Track 1 svgdev |
SNF Cleanroom Paul G Allen L107 |
 |
The SVG (Silicon Valley Group) developer is an automated system with two independent tracks (svgdev and svgdev2) for developing and post-baking exposed photoresist-coated 4" wafers. Each track system includes two...Read more |
SVG Resist Develop tracks 1 and 2 Training |
|
SVG Develop Track 2 svgdev2 |
SNF Cleanroom Paul G Allen L107 |
 |
The SVG (Silicon Valley Group) developer is an automated system with two independent tracks (svgdev and svgdev2) for developing and post-baking exposed photoresist-coated 4" wafers. Each track system includes two...Read more |
SVG Resist Develop tracks 1 and 2 Training |
|
Wet Bench Miscellaneous wbmiscres |
SNF Cleanroom Paul G Allen L107 |
 |
The wbmiscres wet bench is primarily used for manual spinning and developing of photoresist. No solvents may be used here. The bench is equipped with a rinse sink with a...Read more |
Wet Bench Miscellaneous Photoresist Training |
