Resist coat
Coating is the term used to cover the substrate (wafer or piece) with a UV light sensitive film that is used to pattern the surface of the material. Spin coating is the most popular method.
| Equipment name & Badger ID | Location | Image | Overview | Link to Training |
|---|---|---|---|---|
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EVG 101 Spray Coater evgspraycoat |
SNF Cleanroom Paul G Allen L107 | EVG 101 Spray Coater Training | ||
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Headway 3 Manual Resist Spinner headway3 |
SNF Exfab Paul G Allen 104 Stinson |
The Headway Coater is used to manually apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time substrate...Read more |
Headway 3 Training | |
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Headway Manual Resist Spinner headway2 |
SNF Cleanroom Paul G Allen L107 |
 |
The Headway Coater is used to apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time, and substrate...Read more |
Headway Manual Resist Spinner Training |
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Laurell Manual Resist Spinner laurell-R |
SNF Cleanroom Paul G Allen L107 | Laurell Manual Resist Spinner Training | ||
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SVG Resist Coat Track 1 svgcoat |
SNF Cleanroom Paul G Allen L107 |
 |
The SVG (Silicon Valley Group) coater is an automated track system for dispensing photoresist on 4" silicon, glass, or quartz wafers. The system includes two stations: a prime oven which...Read more |
SVG Resist Coat Tracks 1 and 2 Training |
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SVG Resist Coat Track 2 svgcoat2 |
SNF Cleanroom Paul G Allen L107 |
 |
The SVG (Silicon Valley Group) coater is an automated track system for dispensing photoresist on 4" silicon, glass, or quartz wafers. The system includes two stations: a prime oven which...Read more |
SVG Resist Coat Tracks 1 and 2 Training |
