For photolithography processing SNF houses three types of UV exposure tools: contact aligner, direct write (mask-less) system, and a stepper. All of these systems utilize near-UV sensitive photoresist for pattern transfer. Selection of the appropriate exposure tool depends upon the specifics of the project. Listed in each tool’s webpage specific capabilities such as resolution, alignment, and substrate handling capability are discussed.
Equipment name & Badger ID | Location | Image | Overview | Link to Training |
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ASML PAS 5500/60 i-line Stepper asml |
SNF Cleanroom Paul G Allen L107 |
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The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm* wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of...Read more |
ASML PAS 5500/60 i-line Stepper Training |
EV Group Contact Aligner evalign |
SNF Cleanroom Paul G Allen L107 |
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The EV Contact Aligner system is part of the Electronic Visions 620 aligner- 501 bonder system. This tool can perform mask-to-wafer alignment for exposure or wafer-to-wafer alignment for bonding. Our...Read more |
EV Group Contact Aligner Training |
Heidelberg MLA 150 heidelberg |
SNF Exfab Paul G Allen 104 Stinson |
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The MLA150 is a high speed direct write lithography tool extended by capabilities formerly only available on Mask Aligners. It can expose the patterns directly without prior fabrication of a...Read more |
Heidelberg Training |
Heidelberg MLA 150 - 2 heidelberg2 |
SNF Cleanroom Paul G Allen L107 |
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The MLA150 is a high speed direct write lithography tool extended by capabilities formerly only available on Mask Aligners. It can expose the patterns directly without prior fabrication of a...Read more |
Heidelberg Training |
Karl Suss MA-6 Contact Aligner 1 karlsuss |
SNF Cleanroom Paul G Allen L107 |
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The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low...Read more |
Karl Suss MA-6 Contact Aligner 1 and 2 Training |
Karl Suss MA-6 Contact Aligner 2 karlsuss2 |
SNF Cleanroom Paul G Allen L107 |
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The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low...Read more |
Karl Suss MA-6 Contact Aligner 1 and 2 Training |