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Exposure

For photolithography processing SNF houses three types of UV exposure tools: contact aligner, direct write (mask-less) system, and a stepper. All of these systems utilize near-UV sensitive photoresist for pattern transfer. Selection of the appropriate exposure tool depends upon the specifics of the project. Listed in each tool’s webpage specific capabilities such as resolution, alignment, and substrate handling capability are discussed.

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Equipment name & Badger ID Location Image Overview Link to Training
ASML PAS 5500/60 i-line Stepper
asml
SNF Cleanroom Paul G Allen L107

The ASML PAS 5500/60 stepper is an i-line system with...Read more

ASML PAS 5500/60 i-line Stepper Training
EV Group Contact Aligner
evalign
SNF Cleanroom Paul G Allen L107

The EV Contact Aligner system is part of the Electronic...Read more

EV Group Contact Aligner Training
Heidelberg MLA 150
heidelberg
SNF Exfab Paul G Allen 104 Stinson
[Photo: image of user at Heidelberg]

The MLA150 is a high speed direct write lithography tool...Read more

Heidelberg Training
Heidelberg MLA 150 - 2
heidelberg2
SNF Cleanroom Paul G Allen L107

The MLA150 is a high speed direct write lithography tool...Read more

Heidelberg Training
Karl Suss MA-6 Contact Aligner 1
karlsuss
SNF Cleanroom Paul G Allen L107
Karlsuss1

The Karl Suss MA-6 Contact Aligner system can perform precision...Read more

Karl Suss MA-6 Contact Aligner 1 and 2 Training
Karl Suss MA-6 Contact Aligner 2
karlsuss2
SNF Cleanroom Paul G Allen L107
Karlsuss2

The Karl Suss MA-6 Contact Aligner system can perform precision...Read more

Karl Suss MA-6 Contact Aligner 1 and 2 Training

Documentation

Project

Equipment name & Badger ID Location Image Overview Link to Training
ASML PAS 5500/60 i-line Stepper
asml
SNF Cleanroom Paul G Allen L107

The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm* wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of...Read more

ASML PAS 5500/60 i-line Stepper Training
EV Group Contact Aligner
evalign
SNF Cleanroom Paul G Allen L107

The EV Contact Aligner system is part of the Electronic Visions 620 aligner- 501 bonder system. This tool can perform mask-to-wafer alignment for exposure or wafer-to-wafer alignment for bonding. Our...Read more

EV Group Contact Aligner Training
Heidelberg MLA 150
heidelberg
SNF Exfab Paul G Allen 104 Stinson
[Photo: image of user at Heidelberg]

The MLA150 is a high speed direct write lithography tool extended by capabilities formerly only available on Mask Aligners. It can expose the patterns directly without prior fabrication of a...Read more

Heidelberg Training
Heidelberg MLA 150 - 2
heidelberg2
SNF Cleanroom Paul G Allen L107

The MLA150 is a high speed direct write lithography tool extended by capabilities formerly only available on Mask Aligners. It can expose the patterns directly without prior fabrication of a...Read more

Heidelberg Training
Karl Suss MA-6 Contact Aligner 1
karlsuss
SNF Cleanroom Paul G Allen L107
Karlsuss1

The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low...Read more

Karl Suss MA-6 Contact Aligner 1 and 2 Training
Karl Suss MA-6 Contact Aligner 2
karlsuss2
SNF Cleanroom Paul G Allen L107
Karlsuss2

The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low...Read more

Karl Suss MA-6 Contact Aligner 1 and 2 Training

Documentation

Project