Exposure

For photolithography processing SNF houses three types of UV exposure tools: contact aligner, direct write (mask-less) system, and a stepper. All of these systems utilize near-UV sensitive photoresist for pattern transfer. Selection of the appropriate exposure tool depends upon the specifics of the project. Listed in each tool’s webpage specific capabilities such as resolution, alignment, and substrate handling capability are discussed.

Equipment name & Badger ID	Location	Overview	Link to Training
ASML PAS 5500/60 i-line Stepper asml	SNF Cleanroom Paul G Allen L107	The ASML PAS 5500/60 stepper is an i-line system with...Read more	ASML PAS 5500/60 i-line Stepper Training
EV Group Contact Aligner evalign	SNF Cleanroom Paul G Allen L107	The EV Contact Aligner system is part of the Electronic...Read more	EV Group Contact Aligner Training
Heidelberg MLA 150 heidelberg	SNF Exfab Paul G Allen 104 Stinson	The MLA150 is a high speed direct write lithography tool...Read more	Heidelberg Training
Heidelberg MLA 150 - 2 heidelberg2	SNF Cleanroom Paul G Allen L107	The MLA150 is a high speed direct write lithography tool...Read more	Heidelberg Training
Karl Suss MA-6 Contact Aligner 1 karlsuss	SNF Cleanroom Paul G Allen L107	The Karl Suss MA-6 Contact Aligner system can perform precision...Read more	Karl Suss MA-6 Contact Aligner 1 and 2 Training
Karl Suss MA-6 Contact Aligner 2 karlsuss2	SNF Cleanroom Paul G Allen L107	The Karl Suss MA-6 Contact Aligner system can perform precision...Read more	Karl Suss MA-6 Contact Aligner 1 and 2 Training

Documentation

Contact Mask Design Principles
Final Presentation: Grayscale lithography for chiral nanophotonic structures
Grayscale lithography for chiral nanophotonic structures: Final Report
Heidelberg MLA 150 Operating Instructions
Helpful hints for grayscale lithography on the Heidelberg MLA 150

When using grayscale lithography on the Heidelberg, there are a few quirks that may slow down your progress. This document provides some warnings and helpful tricks to overcome the common roadblocks.
Helpful hints for grayscale lithography on the Heidelberg MLA 150

When using grayscale lithography on the Heidelberg, there are a few quirks that may slow down your progress. This document provides some warnings and helpful tricks to overcome the common roadblocks.
Overview of JEOL EBL for Curved Structures
Stanford Nanoscribe Operating Procedure

This is the operating procedure written by our researchers for use of our Nanoscribe.
Stanford Nanoscribe Operating Procedure

This is the operating procedure written by our researchers for use of our Nanoscribe.
Tiny Tale Gets Grand

Professor Richard Feynman issued a challenge to the world in 1960 to miniaturize the text on a page of a book to such an extent that it could be readable by an electron microscope. Twenty-six years later, Tom Newman, Stanford Graduate Student of Professor Fabian Pease finally claimed the $1,000 prize!

Project

Equipment name & Badger ID	Location	Overview	Link to Training
ASML PAS 5500/60 i-line Stepper asml	SNF Cleanroom Paul G Allen L107	The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm^* wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of...Read more	ASML PAS 5500/60 i-line Stepper Training
EV Group Contact Aligner evalign	SNF Cleanroom Paul G Allen L107	The EV Contact Aligner system is part of the Electronic Visions 620 aligner- 501 bonder system. This tool can perform mask-to-wafer alignment for exposure or wafer-to-wafer alignment for bonding. Our...Read more	EV Group Contact Aligner Training
Heidelberg MLA 150 heidelberg	SNF Exfab Paul G Allen 104 Stinson	The MLA150 is a high speed direct write lithography tool extended by capabilities formerly only available on Mask Aligners. It can expose the patterns directly without prior fabrication of a...Read more	Heidelberg Training
Heidelberg MLA 150 - 2 heidelberg2	SNF Cleanroom Paul G Allen L107	The MLA150 is a high speed direct write lithography tool extended by capabilities formerly only available on Mask Aligners. It can expose the patterns directly without prior fabrication of a...Read more	Heidelberg Training
Karl Suss MA-6 Contact Aligner 1 karlsuss	SNF Cleanroom Paul G Allen L107	The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low...Read more	Karl Suss MA-6 Contact Aligner 1 and 2 Training
Karl Suss MA-6 Contact Aligner 2 karlsuss2	SNF Cleanroom Paul G Allen L107	The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low...Read more	Karl Suss MA-6 Contact Aligner 1 and 2 Training

Documentation

Contact Mask Design Principles
Final Presentation: Grayscale lithography for chiral nanophotonic structures
Grayscale lithography for chiral nanophotonic structures: Final Report
Heidelberg MLA 150 Operating Instructions
Helpful hints for grayscale lithography on the Heidelberg MLA 150

When using grayscale lithography on the Heidelberg, there are a few quirks that may slow down your progress. This document provides some warnings and helpful tricks to overcome the common roadblocks.
Helpful hints for grayscale lithography on the Heidelberg MLA 150

When using grayscale lithography on the Heidelberg, there are a few quirks that may slow down your progress. This document provides some warnings and helpful tricks to overcome the common roadblocks.
Overview of JEOL EBL for Curved Structures
Stanford Nanoscribe Operating Procedure

This is the operating procedure written by our researchers for use of our Nanoscribe.
Stanford Nanoscribe Operating Procedure

This is the operating procedure written by our researchers for use of our Nanoscribe.
Tiny Tale Gets Grand

Professor Richard Feynman issued a challenge to the world in 1960 to miniaturize the text on a page of a book to such an extent that it could be readable by an electron microscope. Twenty-six years later, Tom Newman, Stanford Graduate Student of Professor Fabian Pease finally claimed the $1,000 prize!

Techniques

Exposure

Documentation

Contact Mask Design Principles

Final Presentation: Grayscale lithography for chiral nanophotonic structures

Grayscale lithography for chiral nanophotonic structures: Final Report

Heidelberg MLA 150 Operating Instructions

Helpful hints for grayscale lithography on the Heidelberg MLA 150

Helpful hints for grayscale lithography on the Heidelberg MLA 150

Overview of JEOL EBL for Curved Structures

Stanford Nanoscribe Operating Procedure

Stanford Nanoscribe Operating Procedure

Tiny Tale Gets Grand

Project

Electron beam lithography for ultra-low-loss photonic devices and systems

Electron beam lithography for ultra-low-loss photonic devices and systems

Grayscale lithography for chiral nanophotonic structures

Documentation

Contact Mask Design Principles

Final Presentation: Grayscale lithography for chiral nanophotonic structures

Grayscale lithography for chiral nanophotonic structures: Final Report

Heidelberg MLA 150 Operating Instructions

Helpful hints for grayscale lithography on the Heidelberg MLA 150

Helpful hints for grayscale lithography on the Heidelberg MLA 150

Overview of JEOL EBL for Curved Structures

Stanford Nanoscribe Operating Procedure

Stanford Nanoscribe Operating Procedure

Tiny Tale Gets Grand

Project

Electron beam lithography for ultra-low-loss photonic devices and systems

Electron beam lithography for ultra-low-loss photonic devices and systems

Grayscale lithography for chiral nanophotonic structures

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Exposure

Documentation

Project

Documentation

Project