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Etching

Etching is a broad term that is used to describe the removal of material from your sample. The sub categories may be helpful for narrowing down your search, and be aware that there may be more than one technique and/or tool that could be used for your process. 

  • Dry etching uses gaseous chemistries and plasma energy to etch materials from the sample. 
  • Wet etching uses liquid chemistries to etch materials from samples. 
  • Vapor etching uses HF Vapor to etch materials. It is primarily used to etch structures that would be damaged during the rinse and dry process in a standard wet etch.
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Equipment name & Badger ID Locationsort descending Image Overview Primary Materials Etched Link to Training
Wet Bench Flexcorr 2
wbflexcorr-2
SNF Cleanroom Paul G Allen L107

Wet Bench flexcorr-2 , part of Wet Bench wbflexcorr-1 and -2, is for wet chemical...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
SPTS uetch vapor etch
uetch
SNF Cleanroom Paul G Allen L107
photo of uetch in SNF Cleanroom
The SPTS uetch vapor system uses anhydrous HF and ethanol at reduced pressure and 45C...Read more SPTS uetch vapor etch Training
Wet Bench CMOS Metal (wbclean3)
wbclean3
SNF Cleanroom Paul G Allen L107

This part of the bench (right side) is the Wet Bench CMOS Metal (wbclean3).  It...Read more

Wet Bench CMOS Metal (wbclean3) Training
AMAT P5000 Etcher
p5000etch
SNF Cleanroom Paul G Allen L107

P5000 is a load-locked, magnetically enhanced reactive ion etching system (MERIE) with two functional process...Read more

AMAT P5000 Etcher Training
Wet Bench Clean_res-hf
wbclean_res-hf
SNF Cleanroom Paul G Allen L107

The wbclean-res-hf is part of the Wet Bench Clean_res-piranha,-hf, and -hotphos bench. This bench (semi-automated)...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training
Technics Asher
technics
SNF Cleanroom Paul G Allen L107

Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma...Read more

Technics Asher Training
Wet Bench Flexcorr 4
wbflexcorr-4
SNF Cleanroom Paul G Allen L107
Wet Bench Flexcorr 1and2 and 3and4 Training
Samco PC300 Plasma Etch System
samco
SNF Cleanroom Paul G Allen L107
Samco Training
Wet Bench Flexcorr 3
wbflexcorr-3
SNF Cleanroom Paul G Allen L107

This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible)...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
MRC Reactive Ion Etcher
mrc
SNF Cleanroom Paul G Allen L107
photo of mrc etcher in SNF cleanroom
The MRC is a general purpose, plasma reactive ion etching system, used to etch a...Read more MRC Reactive Ion Etcher Training
Drytek 100 Plasma Etcher
drytek2
SNF Cleanroom Paul G Allen L107
photo of drytek2 etcher in SNF cleanroom

The Drytek plasma etchers at SNF all use chlorine and fluorine-based chemistry for etching various...Read more

Drytek 100 Plasma Etcher Training
Gasonics Aura Asher
gasonics
SNF Cleanroom Paul G Allen L107

The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist...Read more

Gasonics Aura Asher Training
Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
SNF Cleanroom Paul G Allen L107
photo of ptmtl in SNF Cleanroom

The Versaline LL-ICP Metal Etcher was acquired in late 2011 for precision metal etching on...Read more

Plasma Therm Versaline LL ICP Metal Etcher Training
Matrix Plasma Resist Strip
matrix
SNF Cleanroom Paul G Allen L107
photo of matrix in SNF cleanroom

The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination...Read more

Matrix Plasma Resist Strip Training
STS Deep RIE Etcher
stsetch
SNF Cleanroom Paul G Allen L107
photo of stsetch in SNF Cleanroom

This is a ICP (Inductive Charged Plasma) Deep Reactive Ion etcher from Surface Technology Systems....Read more

STS Deep RIE Etcher Training
Xactix Xenon Difluoride Etcher
xactix
SNF Cleanroom Paul G Allen L107

The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher.  XeF2 is a vapor...Read more

Xactix Xenon Difluoride Etcher Training
Oxford III-V etcher
Ox-35
SNF Cleanroom Paul G Allen L107
photo of ox35 in SNF Cleanroom

The Oxford III-V Etcher (Ox-35) is an inductively-coupled plasma (ICP) reactive ion etcher (RIE), designed...Read more

Oxford III-V etcher Training
Plasma Therm Versaline LL ICP Deep Silicon Etcher
PT-DSE
SNF Cleanroom Paul G Allen L107
photo of PT-DSE in SNF Cleanroom
PT-DSE is an ICP (Inductively Coupled Plasma) etch system configured for Si etches using Bosch...Read more
Plasma Therm Versaline LL ICP Deep Silicon Etcher Training
Oxford Dielectric Etcher
oxford-rie
SNF Cleanroom Paul G Allen L107
photo of oxrie etcher in SNF Cleanroom
Oxford-rie is a capacitively coupled plasma (ccp) etch equipment with fluorine based etch gases and...Read more Oxford Dielectric Etcher Training
Wet Bench Clean_res- hotphos
wbclean_res-hotphos
SNF Cleanroom Paul G Allen L107

The wbclean_res-hotphos is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training

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