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Etching

Etching is a broad term that is used to describe the removal of material from your sample. The sub categories may be helpful for narrowing down your search, and be aware that there may be more than one technique and/or tool that could be used for your process.

Dry etching uses gaseous chemistries and plasma energy to etch materials from the sample.
Wet etching uses liquid chemistries to etch materials from samples.
Vapor etching uses HF Vapor to etch materials. It is primarily used to etch structures that would be damaged during the rinse and dry process in a standard wet etch.

Equipment name & Badger ID	Location	Overview	Primary Materials Etched	Link to Training
Wet Bench Flexcorr 2 wbflexcorr-2	SNF Cleanroom Paul G Allen L107	Wet Bench flexcorr-2 , part of Wet Bench wbflexcorr-1 and -2, is for wet chemical...Read more		Wet Bench Flexcorr 1and2 and 3and4 Training
SPTS uetch vapor etch uetch	SNF Cleanroom Paul G Allen L107	The SPTS uetch vapor system uses anhydrous HF and ethanol at reduced pressure and 45C...Read more	SiO₂	SPTS uetch vapor etch Training
Wet Bench CMOS Metal (wbclean3) wbclean3	SNF Cleanroom Paul G Allen L107	This part of the bench (right side) is the Wet Bench CMOS Metal (wbclean3). It...Read more	Al Ti W	Wet Bench CMOS Metal (wbclean3) Training
AMAT P5000 Etcher p5000etch	SNF Cleanroom Paul G Allen L107	P5000 is a load-locked, magnetically enhanced reactive ion etching system (MERIE) with two functional process...Read more	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	AMAT P5000 Etcher Training
Wet Bench Clean_res-hf wbclean_res-hf	SNF Cleanroom Paul G Allen L107	The wbclean-res-hf is part of the Wet Bench Clean_res-piranha,-hf, and -hotphos bench. This bench (semi-automated)...Read more	SiO	Wet Bench Clean Piranha/HF/Phosphoric Training
Technics Asher technics	SNF Cleanroom Paul G Allen L107	Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma...Read more	Resist	Technics Asher Training
Wet Bench Flexcorr 4 wbflexcorr-4	SNF Cleanroom Paul G Allen L107			Wet Bench Flexcorr 1and2 and 3and4 Training
Samco PC300 Plasma Etch System samco	SNF Cleanroom Paul G Allen L107		Resist	Samco Training
Wet Bench Flexcorr 3 wbflexcorr-3	SNF Cleanroom Paul G Allen L107	This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible)...Read more		Wet Bench Flexcorr 1and2 and 3and4 Training
MRC Reactive Ion Etcher mrc	SNF Cleanroom Paul G Allen L107	The MRC is a general purpose, plasma reactive ion etching system, used to etch a...Read more	Metals Various Dielectrics	MRC Reactive Ion Etcher Training
Drytek 100 Plasma Etcher drytek2	SNF Cleanroom Paul G Allen L107	The Drytek plasma etchers at SNF all use chlorine and fluorine-based chemistry for etching various...Read more	Si SiN Poly Silicon Resist	Drytek 100 Plasma Etcher Training
Gasonics Aura Asher gasonics	SNF Cleanroom Paul G Allen L107	The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist...Read more	Resist	Gasonics Aura Asher Training
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL	SNF Cleanroom Paul G Allen L107	The Versaline LL-ICP Metal Etcher was acquired in late 2011 for precision metal etching on...Read more	Al Various	Plasma Therm Versaline LL ICP Metal Etcher Training
Matrix Plasma Resist Strip matrix	SNF Cleanroom Paul G Allen L107	The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination...Read more	Resist	Matrix Plasma Resist Strip Training
STS Deep RIE Etcher stsetch	SNF Cleanroom Paul G Allen L107	This is a ICP (Inductive Charged Plasma) Deep Reactive Ion etcher from Surface Technology Systems....Read more	Si	STS Deep RIE Etcher Training
Xactix Xenon Difluoride Etcher xactix	SNF Cleanroom Paul G Allen L107	The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher. XeF2 is a vapor...Read more	Ge Si SiGe	Xactix Xenon Difluoride Etcher Training
Oxford III-V etcher Ox-35	SNF Cleanroom Paul G Allen L107	The Oxford III-V Etcher (Ox-35) is an inductively-coupled plasma (ICP) reactive ion etcher (RIE), designed...Read more	GaAs	Oxford III-V etcher Training
Plasma Therm Versaline LL ICP Deep Silicon Etcher PT-DSE	SNF Cleanroom Paul G Allen L107	PT-DSE is an ICP (Inductively Coupled Plasma) etch system configured for Si etches using Bosch...Read more	Si	Plasma Therm Versaline LL ICP Deep Silicon Etcher Training
Oxford Dielectric Etcher oxford-rie	SNF Cleanroom Paul G Allen L107	Oxford-rie is a capacitively coupled plasma (ccp) etch equipment with fluorine based etch gases and...Read more	SiC SiN SiO₂ PI	Oxford Dielectric Etcher Training
Wet Bench Clean_res- hotphos wbclean_res-hotphos	SNF Cleanroom Paul G Allen L107	The wbclean_res-hotphos is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of...Read more	SiN	Wet Bench Clean Piranha/HF/Phosphoric Training