Hydrogen peroxide mixtures are used for etching common CMOS metals like Al, Ti and W.
Manual wet etching of non-standard materials using only SNF approved acids or bases. Hot plate available. GaAs allowed in personal labware only.
Wet bench part of semiclean cleanliness group to etch Al, Ti, W, or silicon oxide from 3, 4, or 6 inch wafers. The tanks can hold up to 25 wafers.
Al, Ti, or W wet etching or oxide etching
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.