Dry etching refers to the processes that use energetic gaseous species produced by a plasma to remove material. In order to modulate and control the etching conditions and characteristics, different types of plasma sources are utilized in the dry etching process and the equipment are categorized accordingly.
No equipment matches all of the filter criteria you have set above. Especially make sure only Main Purpose OnlyORFull Purpose has something in it other than "- Any -"—they do not play well with each other!
Dr. James McVittie introduces Dry Etching (Part 1 of 4) from Stanford Nanofabrication Facility (SNF). This video is part of an open online course found here: https://lagunita.stanford.edu/courses/course-v1:Engineering+NanoFab01+Ongoing/info