MERIE, Magnetically Enhanced Reactive Ion Etching, is where a magnetic field is applied in a capacitively coupled plasma etcher. Applied magnetic field enhances the etch rate while reducing the bias voltage simultaneously for a given RF power setting. A rotating magnetic field is generated by varying the current between the four electromagnetic coils placed around the electrode.
|Equipment name & Badger ID||Location||Image||Overview||Primary Materials Etched||Link to Training|
AMAT P5000 Etcher
|SNF Cleanroom Paul G Allen L107||
P5000 is a load-locked, magnetically enhanced reactive ion etching system (MERIE) with two functional process...Read more
|AMAT P5000 Etcher Training|