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Deposition

Deposition covers a wide variety of methods that are used to add a wide variety of materials. The subcategories here can be useful to help narrow down your search.

  • Atomic Layer Deposition (ALD) is used to deposit less than 50nm of highly conformal films.
  • Chemical Vapor Deposition (CVD) is used to deposit films less than 5μm thick, carbon nanotubes, and graphene.
  • Deposited III-N uses a type of CVD called MOCVD to deposit the nitrides of materials that are found in group III of the periodic table.
  • Deposited III-V uses a type of CVD called MOCVD to deposit combinations of materials from group III and group V of the periodic table.
  • Ink lists the equipment that can be used to print inks that are either commercially available or made by the user.
  • Physical Vapor Deposition (PVD) is used to deposit primarily metal layers as well as some dielectrics.
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Equipment name & Badger ID Location Image Overview Materials Lab Supplied Link to Training
PlasmaTherm Shuttlelock PECVD System
ccp-dep
SNF Cleanroom Paul G Allen L107
PlasmaTherm Shuttlelock PECVD System Training
PlasmaTherm Versaline HDP CVD System
hdpcvd
SNF Cleanroom Paul G Allen L107
PlasmaTherm Versaline HDP CVD System Training
Savannah
savannah
SNF Cleanroom Paul G Allen L107
photo of Savannah in SNF cleanroom

Savannah is a thermal atomic layer deposition (ALD) system. It...

Savannah Training
STS Plasma Enhanced CVD
sts
SNF Cleanroom Paul G Allen L107
STS Plasma Enhanced CVD Training
Teos2
teos2
SNF Cleanroom Paul G Allen L107

Teos2 furnace allows LPCVD deposition of silicon dioxide, using tetraethyl...

Teos Deposition Furnace Training
ThermcoLTO
thermcoLTO
SNF Cleanroom Paul G Allen L107

Silicon dioxide (SiO2) is deposited at between 300 and 450C...

Thermco LTO Deposition Furnace Training
ThermcoNitride
thermconitride1
SNF Cleanroom Paul G Allen L107

Silicon nitride (or nitride or Si3N4) is deposited at moderately...

Thermco Nitride Deposition Furnace Training
ThermcoPoly1
thermcopoly1
SNF Cleanroom Paul G Allen L107

Polycrystalline silicon (also called "poly-Si" or "poly") is deposited at...

Thermco Poly Deposition Furnace Training
ThermcoPoly2
thermcopoly2
SNF Cleanroom Paul G Allen L107

Same as ThermcoPoly1 but in the "flexible (gold-contaminated)" group.  ...

Thermco Poly Deposition Furnace Training
TylanBPSG
tylanbpsg
SNF Cleanroom Paul G Allen L107

Silicon dioxide (SiO2) is deposited at between 300 and 450C...

TylanBPSG Deposition Furnace Training
Voltera
voltera
SNF Exfab Paul G Allen 151 Ocean
Voltera Training

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