Deposition covers a wide variety of methods that are used to add a wide variety of materials. The subcategories here can be useful to help narrow down your search.
Atomic Layer Deposition (ALD) is used to deposit less than 50nm of highly conformal films.
Chemical Vapor Deposition (CVD) is used to deposit films less than 5μm thick, carbon nanotubes, and graphene.
Deposited III-N uses a type of CVD called MOCVD to deposit the nitrides of materials that are found in group III of the periodic table.
Deposited III-V uses a type of CVD called MOCVD to deposit combinations of materials from group III and group V of the periodic table.
Ink lists the equipment that can be used to print inks that are either commercially available or made by the user.
Physical Vapor Deposition (PVD) is used to deposit primarily metal layers as well as some dielectrics.
No equipment matches all of the filter criteria you have set above. Especially make sure only Main Purpose OnlyORFull Purpose has something in it other than "- Any -"—they do not play well with each other!
We aim to develop a process to thermally oxidize Cu and reliably grow Cu2O for the purpose of photonics integration, and ultimately probe the promise of this platform for nonlinear and quantum optics experiments