Deposited Oxide (PECVD)

PECVD oxide deposited in the ccp system is produced by the reaction between silane (5% silane in He) and N2O. In the HDP system the reactants are silane and O2.

Equipment name & Badger ID	Location	Link to Training
PlasmaTherm Shuttlelock PECVD System ccp-dep	SNF Cleanroom Paul G Allen L107	PlasmaTherm Shuttlelock PECVD System Training
PlasmaTherm Versaline HDP CVD System hdpcvd	SNF Cleanroom Paul G Allen L107	PlasmaTherm Versaline HDP CVD System Training
STS Plasma Enhanced CVD sts	SNF Cleanroom Paul G Allen L107	STS Plasma Enhanced CVD Training

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Techniques

Deposited Oxide (PECVD)