SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Deposited Amorphous Silicon (LPCVD)
Poly crystalline or amorphous silicon is deposited by low pressure chemical vapor deposition at temperatures between 550-800C and silane as the precursor. Other precursors such as disilane or dichorosilane can be used. By adding sopants to the reaction mxture, doped Si can be deposited as well.
| Equipment name & Badger ID | Location | Image | Overview | Materials Lab Supplied | Link to Training |
|---|---|---|---|---|---|
|
ThermcoPoly1 thermcopoly1 |
SNF Cleanroom Paul G Allen L107 |
 |
Polycrystalline silicon (also called "poly-Si" or "poly") is deposited at... |
Thermco Poly Deposition Furnace Training | |
|
ThermcoPoly2 thermcopoly2 |
SNF Cleanroom Paul G Allen L107 |
 |
Same as ThermcoPoly1 but in the "flexible (gold-contaminated)" group. ... |
Thermco Poly Deposition Furnace Training |
