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Cleaning

During integrated processing, cleaning steps are often inserted to remove un-needed resist, post-etch residues and particles, or to prepare a surface for a following process. The various tools listed here perform both dry and wet cleaning. The cleaning method you will need will depend on the materials you would like to remove as well as the contamination category of your sample. (For more about the contamination categories, please visit the Cleanliness (previously Contamination) Groups page).

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Cleanliness Equipment name & Badger ID Locationsort descending Image Overview Link to Training
Flexible Ex Fab Solvent Wet Bench
wbexfab_solv
SNF Exfab Paul G Allen 104 Stinson

Exfab solvent wet bench (wbexfab_solv, wbexfab_plug - badger names) is for wet chemical processing with solvents of standard and non-standard...Read more

WbExfab_Solv Training
Flexible Wet Bench Flexible Solvents 2
wbflexsolv-2
SNF Cleanroom Paul G Allen L107
Wet Bench Flexible Solvents

The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more

Wet Bench Flexible Solvents 1 and 2 Training
Clean Wet Bench Decontamination
wbdecon
SNF Cleanroom Paul G Allen L107

This part of the bench (left side), wbdecon, has one HCl bath, dump rinser, and SRD for the decontamination of...Read more

Wet Bench Decontamination Training
Flexible Lithography Solvent Bench
lithosolv
SNF Cleanroom Paul G Allen L107

The lithosolv wet bench is used for handling solvents or other volatile organics such as photoresist. Processes performed here include...Read more

Lithography Solvent Bench Training
Clean Wet Bench Clean_res-piranha
wbclean_res-piranha
SNF Cleanroom Paul G Allen L107

The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training
Flexible Wet Bench Flexcorr 3
wbflexcorr-3
SNF Cleanroom Paul G Allen L107

This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible) materials like glass, wafer pieces,...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexible Solvents
wbflexsolv
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more

Wet Bench Flexible Solvents 1 and 2 Training
Clean Wet Bench Clean 1
wbclean-1
SNF Cleanroom Paul G Allen L107
Wet Bench Clean 1 and 2

The Wet Bench Clean-1 and 2 is used for cleaning 3", 4", and 6" silicon, silicon germanium, or quartz wafers...Read more

Wet Bench Clean 1 and 2 Training
Clean, Semiclean Gasonics Aura Asher
gasonics
SNF Cleanroom Paul G Allen L107

The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist of clean 4 inch wafers...Read more

Gasonics Aura Asher Training
Flexible Matrix Plasma Resist Strip
matrix
SNF Cleanroom Paul G Allen L107
photo of matrix in SNF cleanroom

The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power,...Read more

Matrix Plasma Resist Strip Training
Clean Wet Bench Clean 2
wbclean-2
SNF Cleanroom Paul G Allen L107
Wet Bench Clean 1 and 2

The Wet Bench Clean-1 and 2 is used for cleaning 3", 4", and 6" silicon, silicon germanium, or quartz wafers...Read more

Wet Bench Clean 1 and 2 Training
Flexible Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Technics Asher
technics
SNF Cleanroom Paul G Allen L107

Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma at ambient temperature.  It is...Read more

Technics Asher Training
Clean (Ge) Wet Bench Germanium
wbgen2
SNF Cleanroom Paul G Allen L107 The Wet Bench Germanium is for acid or base processing of Clean Germanium wafers only   Read more Wet Bench Germanium Training
Flexible Samco PC300 Plasma Etch System
samco
SNF Cleanroom Paul G Allen L107
Samco Training
Flexible Wet Bench Flexcorr 2
wbflexcorr-2
SNF Cleanroom Paul G Allen L107

Wet Bench flexcorr-2 , part of Wet Bench wbflexcorr-1 and -2, is for wet chemical (corrosives) processing of standard (like...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexcorr 4
wbflexcorr-4
SNF Cleanroom Paul G Allen L107
Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexible Solvents 1
wbflexsolv-1
SNF Cleanroom Paul G Allen L107
Wet Bench Flexible Solvents

The Solvent Wet Bench is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects...Read more

Wet Bench Flexible Solvents 1 and 2 Training