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Furnace Annealing

Furnaces annealing is a heated process perfomeded in an Annealing Furnace to can change material properties of a sample.  Anneal parameters include temperature, ramp time, anneal time, ambient gas. Generally anneal times range from 15 minutes to many hours.

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Equipment name & Badger ID Image Cleanliness Cleaning Required Gases Substrate Size Process Temperature Range Maximum Load (number of wafers) Notes
Thermco1
thermco1
Clean Pre-Diffusion Clean
700 °C - 1100 °C
50

Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.

Thermco3
thermco 3
Clean Pre-Diffusion Clean
700 °C - 1100 °C
50

Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.

Thermco4
thermco4
Flexible
700 °C - 1100 °C
50

Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.

Tylan9
tylan9
Flexible
250 °C - 1100 °C
50

Any material that won't vaporize is okay. N2 and Ar annealing available.

Tylanfga
tylanfga
Semiclean Standard Metal Clean
250 °C - 800 °C
50

For standard metals deposited in Lesker2, Intlvac Sputter or Intlvac Evaporation only. N2 and Ar annealing available. Please contact staff for more information.