Lithography Solvent Bench (lithosolv)
The lithosolv wet bench is used for handling solvents or other volatile organics such as photoresist. Processes performed here include mask and substrate cleaning and pouring resist into smaller containers for manual dispensing. Acids and bases (namely, developers) must never be handled here. Liquid waste is collected locally. A solid hazardous waste under the benchtop is used to collect cleanroom wipes, vinyl gloves, swabs, and other solid materials which may be contaminated with solvents and photoresist.
Capabilities and Specifications
Process Temperature Range:
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.
Lab Organization, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
Read the relevant operating procedures:
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF