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Lithography Solvent Bench (lithosolv)


The lithosolv wet bench is used for handling solvents or other volatile organics such as photoresist. Processes performed here include mask and substrate cleaning and pouring resist into smaller containers for manual dispensing. Acids and bases (namely, developers) must never be handled here. Liquid waste is collected locally. A solid hazardous waste under the benchtop is used to collect cleanroom wipes, vinyl gloves, swabs, and other solid materials which may be contaminated with solvents and photoresist.


Processing Technique(s)

Capabilities and Specifications

Process Temperature Range: 

Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. "All Litho" class is required before training on any of the lithography tools. Read more here: All Litho class.
  2. Sign up for the relevant training scheduled in .
  3. Read the relevant operating procedures:
  4. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form on clean room paper.
  5. Contact the primary trainer: .

Operating Instructions