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Karl Suss MA-6 Contact Aligner 2 (karlsuss2)

Overview

Karlsuss2

The Karl Suss MA-6 Contact Aligner system can perform precision mask-to-wafer front- or back-side alignment and near-UV photoresist exposure in hard- and soft- contact, as well as high and low vacuum contact; proximity is not available. Our current configuration accommodates 3", 4" and 6" wafers and pieces. SNF has two MA-6 aligners (karlsuss and karlsuss2).

Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Lithography Specifications

Minimum Resolution: 
1.50 μm
Exposure Wavelength: 
365 nm or 405 nm
Mask Size: 
Max Exposure Area: 
5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch
Process Temperature Range: 
Notes: 

1:1 Contact Aligner.
Backside align.

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Training Charges: 
1.50 hours
Primary Trainer: 
Backup Trainer(s): 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
  2. Read the relevant operating procedures:
  3. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Follow the instructions on this form: SNF Training Shadowing Form
  4. Contact the primary trainer: .

Operating Instructions