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Stanford Nanofabrication Facility
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Equipment
Equipment Name Table
Characterization Equipment
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Dry Etch Equipment
Metallization Equipment
Oxidation and Annealing Equipment
Photolithography Equipment
Wet Bench Equipment
HMDS Vapor Prime Oven, YES2 (yes2)
Cleanliness:
All
Processing Technique(s)
Optical Photolithography
>
Wafer preparation before resist
>
Wafer Prime (HMDS)
Capabilities and Specifications
Lithography Specifications
Developer:
HMDS
Process Temperature Range:
150 ºC
Maximum Load:
25
Notes:
Singe and prime. No Resist allowed!
Lab Organization, Location, and Badger Information
Lab Organization:
(SNF Exfab)
Location:
SNF Exfab Paul G Allen 104 Stinson
Badger Area:
nSiL: L104 Stinson
Badger ID:
yes2
Training and Maintenance
Lab Facility:
SNF Exfab
Training Charges:
0.00 hours
Primary Trainer:
Swaroop Kommera
Backup Trainer(s):
Cliff Knollenberg
Uli Thumser
Primary Maintenance:
Gary Sosa
Backup Maintenance:
Mario Vilanova
Steps to become a tool user
Become a
member of SNF
.
"All Litho" class is required before training on any of the lithography tools. Please send an email to
all-litho-training@lists.stanford.edu
to sign up for the All Litho class. Read more here:
All Litho class
.
Contact the primary trainer:
Swaroop Kommera