HMDS Vapor Prime Oven, YES (yes)
Overview
The YES prime oven dehydrates the wafers at 150ºC and primes the wafers using HMDS (Hexamethyldisilazane) allowing better coverage and adhesion between oxides and resists.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Process Temperature Range:
150 ºC
Chemicals
Substrate Type
Substrate Sizes
Notes:
Two programs: Singe and HMDS prime or Singe only. No Resist allowed!
Lab Facility, Location, and Badger Information
Lab Organization:
Location:
Badger Area:
Badger ID:
yes
Training and Maintenance
Lab Facility:
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Sign up for the relevant training scheduled in .
- Read the relevant operating procedures:
- Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the . We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
Print the SNF Training Shadowing Form on clean room paper. - Contact the primary trainer: .
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