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Headway 3 Manual Resist Spinner (headway3)

Overview

The Headway Coater is used to manually apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time substrate and fluid properties of the photoresist determine the final thickness of the film.

Once you are trained on the tool, please join the tool discussion list. The instruction and the lists are located at https://snfexfab.stanford.edu/snf/join/discussion-lists

Cleanliness: 

Capabilities and Specifications

Lithography Specifications

Process Temperature Range: 
Maximum Load: 
1 piece or wafer

Lab Facility, Location, and Badger Information

Lab Organization: 
Badger Area: 
Badger ID: 
headway3

Training and Maintenance

Lab Facility: 
Training Charges: 
1.00 hours
Primary Trainer: 
Backup Trainer(s): 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
  2. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the . We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form on clean room paper. Or send an email to the primary contact with date and time of shadowing and cc the person you shadowed.
  3. Contact the primary trainer: .
  4. Headway 2 and 3 are trained together.