Skip to content Skip to navigation

Gasonics Aura Asher (gasonics)

Overview

The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist of clean 4 inch wafers which are in the 'clean' cleanliness group. The system generates a plasma of oxygen and nitrogen in a reaction chamber. This reactive mixture flows downstream to the process chamber where it reaches a state of “afterglow,” where it is highly reactive and no longer electrically active or damaging to the wafer surface. The dissociated oxygen chemically reacts with the photoresist effectively burning the resist off the wafer.

Cleanliness: 

Capabilities and Specifications

Process Temperature Range: 
Maximum Load: 
25
Notes: 

Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Wafers heated by lamps.

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Primary Trainer: 
Backup Trainer(s): 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
  2. Contact the primary trainer: . Submit the shadowing form to get qualified.