The wbexfab_dev wet bench is primarily used for developing of photoresist. No solvents may be used here. Please use solvent wet bench for SU8 development. The bench is equipped with an automatic dump rinser (QDR), two N2 guns, 2 DI hand sprayers, a rinse sink with a gooseneck and a drain, an aspirator and a glove rinsing station.
Once you are trained on the tool, please join the tool discussion list. The instruction and the lists are located at https://snfexfab.stanford.edu/snf/join/discussion-lists
Manual development of resist in beakers. SNF approved developers only. No solvents!