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Ex Fab Develop Wet Bench (wbexfab_dev)

Overview

The wbexfab_dev wet bench is primarily used for developing of photoresist. No solvents may be used here. Please use solvent wet bench for SU8 development. The bench is equipped with an automatic dump rinser (QDR), two N2 guns, 2 DI hand sprayers, a rinse sink with a gooseneck and a drain, an aspirator and a glove rinsing station.

 

Once you are trained on the tool, please join the tool discussion list. The instruction and the lists are located at https://snfexfab.stanford.edu/snf/join/discussion-lists

Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Lab Facility, Location, and Badger Information

Lab Organization: 
Badger Area: 
Badger ID: 
wbexfab_dev

Training and Maintenance

Lab Facility: 
Training Charges: 
1.00 hours
Primary Trainer: 
Primary Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Contact the primary trainer: .