Ex Fab Develop Wet Bench (wbexfab_dev)
Overview
The wbexfab_dev wet bench is primarily used for developing of photoresist. No solvents may be used here. Please use solvent wet bench for SU8 development. The bench is equipped with an automatic dump rinser (QDR), two N2 guns, 2 DI hand sprayers, a rinse sink with a gooseneck and a drain, an aspirator and a glove rinsing station.
Once you are trained on the tool, please join the tool discussion list. The instruction and the lists are located at https://snfexfab.stanford.edu/snf/join/discussion-lists
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lithography Specifications
Developer:
Substrate Sizes
Notes:
Manual development of resist in beakers. SNF approved developers only. No solvents!
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
nSiL: L104 Stinson
NEMO ID:
wbexfab_dev
Training and Maintenance
Lab Facility:
Training Charges:
1.00 hours
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Study the relevant operating procedures:
- Contact the primary trainer: Swaroop Kommera
