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Epi2 (epi2)

Overview

Applied Materials Centura Epi2 tool in SNF

Epi2 is the the first chamber on the tool and is referred to as Chamber A in most Epi communications.

Cleanliness: 
Clean

Processing Technique(s)

Capabilities and Specifications

Cleaning Required: 
Pre-Diffusion Clean
Material Thickness Range: 50.0 Å - 3.0 μm
Process Temperature Range: 
600 °C - 1200 °C
Maximum Load: 
1
Notes: 

N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr

Lab Organization, Location, and Badger Information

Lab Organization: 
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location: 
SNF Cleanroom Paul G Allen L107
Badger Area: 
SNF: Chemical Vapor Deposition
Badger ID: 
epi2

Training and Maintenance

Lab Facility: 
SNF Cleanroom
Training Charges: 
4.00 hours
Primary Trainer: 
Maurice Stevens
Primary Maintenance: 
Carsen Kline

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
  2. Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
  3. Contact the primary trainer:
    .

Operating Instructions

Epi2
Equipment name & Badger ID Cleanliness Cleaning Required Gases Substrate Size Process Temperature Range Maximum Load (number of wafers) Notes
Epi2
epi2 		Clean Pre-Diffusion Clean
600 °C - 1200 °C
1

N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr
ThermcoLTO
thermcoLTO 		Flexible
300 °C - 450 °C
26

limits on material vapor pressure
ThermcoPoly1
thermcopoly1 		Clean Pre-Diffusion Clean
525 °C - 650 °C
44

Standard polysilicon deposition at 620C. P and N doping available. Amorphous Si programs available.
ThermcoPoly2
thermcopoly2 		Flexible Pre-Diffusion Clean
525 °C - 650 °C
44

Standard polysilicon deposition at 620C. P and N doping available.
TylanBPSG
tylanbpsg 		Clean, Semiclean Pre-Diffusion Clean, Standard Metal Clean
300 °C - 450 °C
26