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Stanford Nanofabrication Facility
SNF is open under
New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
Lab User Guide
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Equipment
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New Normal Policies
Equipment
Equipment Table
Characterization Equipment
CVD Equipment
Doping Equipment
Dry Etch Equipment
Metallization Equipment
Photolithography Equipment
Wet Bench Equipment
Related Documentation
PROM Request(s)
Al2O3 ALD on TMD in MVD Savannah
Ebeam Process Wet Bench (wbebres)
Cleanliness:
Flexible
Processing Technique(s)
Optical Photolithography
>
Resist Develop
>
Resist Develop (manual)
Capabilities and Specifications
Process Temperature Range:
Chemicals
Solvents
Substrate Sizes
Pieces
2 inch wafer
3 inch wafer
4 inch wafer
Notes:
Manual developing of Ebeam resist
Lab Facility, Location, and Badger Information
Lab Organization:
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location:
SNF Cleanroom Paul G Allen L107
Badger Area:
SNF: Photolithography
Badger ID:
wbebres
Training and Maintenance
Lab Facility:
SNF Cleanroom
Primary Maintenance:
Gary Sosa
Backup Maintenance:
Mario Vilanova
Steps to become a tool user
Become a
member of SNF
.
"All Litho" class is required before training on any of the lithography tools. Please send an email to
all-litho-training@lists.stanford.edu
to sign up for the All Litho class. Read more here:
All Litho class
.
Contact the primary trainer:
.
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