Critical Point Dryer (cpd)
The Automegasamdri-915B Critical Point Drying (CPD) tool is used for carbon dioxide (CO2) drying after release of bulk or surface micromachined devices. Critical point drying is an efficient method of drying delicate samples without damaging it's structure by surface tension that occurs when changing from the liquid to the gaseous phase. The release is usually performed by immersion of the device in hydrofluoric acid followed by subsequent immersions in several beakers of DI water. The CPD requires that the device be completely free of acid or water before introducing it to the chamber. To avoid this, the device should be placed in isopropyl alcohol for at least one hour.
Capabilities and Specifications
Process Temperature Range:
CO2 drying after release of micromachined devices
Lab Facility, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
Read the relevant operating procedures:
Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the . We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
Print the SNF Training Shadowing Form
on clean room paper.
Sign up for the relevant training scheduled in