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AMT Oxide Plasma Etcher (amtetcher)

Overview

photo of AMT etcher in SNF cleanroom
Reactive Ion Etcher for Oxides or Nitrides.  Also can be used for Si trench etching.
Cleanliness: 

Capabilities and Specifications

Process Temperature Range: 
Maximum Load: 
24
Notes: 

Batch processing tool with hexode configuration; pieces need to be mounted on a carrier wafer for etching

Lab Facility, Location, and Badger Information

Training and Maintenance

photo of amt etcher in SNF cleanroom
Lab Facility: 
Training Charges: 
1.00 hours
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Check the training calendar for any scheduled training:.
  2. Contact the primary trainer, , to sign up for the training or to schedule a training if none is scheduled.
  3. Read the relevant operating procedures:
  4. Get qualified by either attending the training or submitting the shadowing form.