Skip to content Skip to navigation

Developers

Developers remove resist in UV-exposed areas (positive resists) or in UV-protected areas (negative resists) using an acid or base to dissolve the resist. The developer chemical required will depend on the specific resist used. 

List of Developers

Partial words okay.
Equipment name & Badger ID Training Required & Chargessort descending Cleanliness Location Chemicals Notes
Wet Bench Miscellaneous
wbmiscres
Wet Bench Miscellaneous Photoresist Training SNF Cleanroom Paul G Allen L107

Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!

Subscribe to