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Enabling Pattern Transfer for Block Copolymer Directed Self-Assembly

Project Type: 
E241
Date: 
June 2018
Areas of Interest: 
Nanoscale patterning, DSA
Report(s): 
Enabling Pattern Transfer for Block Copolymer Directed Self-Assembly- Final Report
Processing Technique (former Function and Method): 
Patterning
Researchers and (Mentors): 
Maryanne Tung, (Michelle Rincon)
List of Important Equipment: 
Lesker Sputter (lesker-sputter)
Oxford Dielectric Etcher (oxford-rie)
PlasmaTherm Shuttlelock PECVD System (ccp-dep)
Nano Nugget(s): 

Basics of Block Copolymer Directed Self Assembly

Block copolymer Directed Self Assembly (DSA) is a technique used to create high resolution structures without advanced lithography techniques.

Presentation(s): 
Enabling Pattern Transfer for Block Copolymer Directed Self-Assembly- Presentation