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Function and Method(s):
Other
Equipment Used:
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
Development of Fluorine Plasma Treatment for AlGaN/GaN Device Isolation- Final Report
Development of Fluorine Plasma Treatment for AlGaN/GaN Device Isolation- Final Report
PDF File:
Development of Fluorine Plasma Treatment for AlGaN/GaN Device Isolation- Final Report
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Thursday, August 10, 2023
