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Function and Method(s):
Patterning
Equipment Used:
Heidelberg MLA 150 (heidelberg)
PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater)
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation
PDF File:
Grayscale Lithography and Resist Reflow for Parylene Patterning- Final Presentation
This should be displaying the file at https://snfguide.stanford.edu/sites/default/files/sections/diplayfiles/finalpresentation_cc_jm.pdf inline. If it's not, look to see if your browser is set to automatically download pdf filess
Materials
Parylene (poly(p-xylylene))
Thursday, August 10, 2023
